Fabrication of in situ ultrathin anodic aluminum oxide layers for nanostructuring on silicon substrate

Journal article (2007)
Department
Microelectronics & Computer Engineering (EEMCS) (TU Delft)
Copyright: © 2007 The Author(s); American Institute of Physics
DOI: https://doi.org/doi:10.1063/1.2767768
Silicon Nanostructured materials Nanolithography Thin films Alumina Porous materials Strontium compounds Elemental semiconductors Barium compounds Nanopatterning Masks
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Published Date

02-08-2007

Reuse Rights

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Source:

Applied Physics Letters, 91 (5), 2007

ISSN:

0003-6951

ISBN:

0003-6951

Source:

http://link.aip.org/link/APPLAB/v91/i5/p053117/s1

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics & Computer Engineering

Abstract

The authors demonstrate a method for the fabrication of in situ ultrathin porous anodic aluminum oxide layers (aspect ratio

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