Molecular simulation strategy for mechanical modeling of amorphous/porous low-dielectric constant materials

Journal article (2008)
Department
Microelectronics & Computer Engineering (EEMCS) (TU Delft)
Copyright: © 2008 The Author(s); American Institute of Physics
DOI: https://doi.org/doi:10.1063/1.2832639
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Published Date

14-02-2008

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Source:

Applied Physics Letters, 92 (6), 2008

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics & Computer Engineering

Abstract

We propose an amorphous/porous molecular connection network generation algorithm for simulating the material stiffness of a low-k material (SiOC:H). Based on a given concentration of the basic building blocks, this algorithm will generate an approximate and large amorphous network. The molecular topology is obtained by distributing these blocks randomly into a predefined framework. Subsequently, a structural relaxation step including local and global perturbations is applied to achieve the most likely stereochemical structure. Thus, the obtained mechanical properties of the low-k materials have been verified with the experimental data.

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