Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design

Journal article (2005)
Department
Optics Research Group (AS) (TU Delft)
Copyright: ©2005 Delft University of Technology
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Published Date

01-03-2005

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Faculty

Applied Sciences

Department

Optics Research Group

Abstract

Poster presentation Optics Research Group TU Delft