Photolithographic patterning of the charge-density-wave conductor Rb 0.30 MoO 3

SEM Transport Scanning electron microscopy Thin films Grain size Electrical resistivity Charge density wave CDW Photolithography 180 K 2.5 mum 20 to 300 K 400 to 500 C 600 nm A6820 Solid surface structure A6855 Thin film growth, structure, and epitaxy A7145L Charge density wave systems A7215N Collective modes: low dimensional conductors A7335 Mesoscopic systems and quantum interference A7360 Electrical properties of thin films and low dimensional structures A8115I Pulsed laser deposition A8160J Surface treatment and degradation of polymers and plastics Charge density wave conductor Charge density waves Current voltage characteristics Electrical transport Electrical transport measurements INSPEC Mesoscopic phenomena Mesoscopic systems Nonlinear current voltage characteristics Patterned structures Peierls instability Peierls transition Phase coherent CDW transport Photolithographic patterning Pulsed laser deposition Rb sub 0.30 MoO sub 3 Rubidium compounds