Nanofabrication with a helium ion microscope

Conference paper (2010)
Department
Kavli Institute of Nanoscience (AS) (TU Delft)
Copyright: ©2010 The Authors
DOI: https://doi.org/doi:10.1117/12.862438
Helium Ion Microscopy Nanofabrication HIM Nanoimaging Scanning helium ion beam lithography SHIBL Lithographyhelium ion beam induced deposition HIBID
More Info
expand_more

Published Date

31-12-2010

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Source:

Proceedings of SPIE, 2010 vol. 7638

ISSN:

0277-786X

Faculty

Applied Sciences

Department

Kavli Institute of Nanoscience

Abstract

The recently introduced helium ion microscope (HIM) is capable of imaging and fabrication of nanostructures thanks to its sub-nanometer sized ion probe [1,2]. The unique interaction of the helium ions with the sample material provides very localized secondary electron emission, thus providing a valuable signal for high-resolution imaging as well as a mechanism for very precise nanofabrication [3]. The low proximity effects, due to the low yield of backscattered ions and the confinement of the forward scattered ions into a narrow cone, enable patterning of ultra-dense sub-10 nm structures. This paper presents various nanofabrication results obtained with direct-write, with scanning helium ion beam lithography, and with helium ion beam induced deposition.

Files

7638Maas.pdf
(pdf | 3.26 Mb)