Helium Ion Beam Processing for Nanofabrication and Beam-Induced Chemistry

Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography

Nanofabrication with the helium ion microscope, in 'Metrology, Inspection and process control for microlithography XXIV

Resist thickness effects on ultra thin HSQ patterning capabilities

Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

Sub-10-nm nanolithography with a scanning helium beam

Towards 2-10 nm electron-beam lithography: a quantitative approach

Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography