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VA Sidorkin
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8 records found
Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography
Doctoral thesis -
VA Sidorkin
Sub-10-nm nanolithography with a scanning helium beam
Journal article -
VA Sidorkin
,
E van Veldhoven
,
E.W.J.M. van der Drift
Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography
Journal article -
VA Sidorkin
,
E.W.J.M. van der Drift
,
H.W.M. Salemink
Towards 2-10 nm electron-beam lithography: a quantitative approach
Journal article -
VA Sidorkin
,
A.J. van Run
,
A.K. van Langen-Suurling
,
AE Grigorescu
,
E.W.J.M. van der Drift
Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist
Journal article -
VA Sidorkin
,
P.F.A. Alkemade
,
P.F.A. Alkemade
,
H.W.M. Salemink
,
R. Schmits
,
E.W.J.M. van der Drift
Resist thickness effects on ultra thin HSQ patterning capabilities
Journal article -
VA Sidorkin
,
AE Grigorescu
,
H.W.M. Salemink
,
E.W.J.M. van der Drift
Nanofabrication with the helium ion microscope, in 'Metrology, Inspection and process control for microlithography XXIV
Journal article -
D Maas
,
E van Veldhoven
,
P Chen
,
VA Sidorkin
,
H.W.M. Salemink
,
E.W.J.M. van der Drift
,
P.F.A. Alkemade
Helium Ion Beam Processing for Nanofabrication and Beam-Induced Chemistry
Journal article -
P.F.A. Alkemade
,
VA Sidorkin
,
P Chen
,
E.W.J.M. van der Drift
,
A.K. van Langen-Suurling
,
D Maas
,
E van Veldhoven