Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography

Helium Ion Beam Processing for Nanofabrication and Beam-Induced Chemistry

Nanofabrication with the helium ion microscope, in 'Metrology, Inspection and process control for microlithography XXIV

Resist thickness effects on ultra thin HSQ patterning capabilities

Sub-10-nm nanolithography with a scanning helium beam

Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist

Influence of HSQ resist exposure temperature on ultra-high resolution electron beam lithography

Towards 2-10 nm electron-beam lithography: a quantitative approach