10 records found
1
Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
InP-based two-dimensional photonic crystals filled with polymers
InP-based planar photonic crystals infiltrated with solid polymers and liquid crystals
Two-dimensional photoni crystals from semiconductor material with polymer filled holes
Deep hole InP photonic crystals infiltrated with solid polymers and liquid crystals
Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP
Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2
Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation