10 records found
1
Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP
Two-dimensional photoni crystals from semiconductor material with polymer filled holes
InP-based planar photonic crystals infiltrated with solid polymers and liquid crystals
InP-based two-dimensional photonic crystals filled with polymers
Deep hole InP photonic crystals infiltrated with solid polymers and liquid crystals
Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl-2
Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation