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S. Steenbrink
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Authored
6 records found
Shot noise in electron beam lithography and line width measurements
Journal article -
P. Kruit
,
S. Steenbrink
Local critical dimension variation from shot-noise related line edge roughness
Journal article -
P. Kruit
,
S. Steenbrink
Predicted effect of shot noise on contact hole dimension in e-beam lithography
Journal article -
P. Kruit
,
S. Steenbrink
,
M.J.J. Wieland
Fabrication and characterization of p-type silicon field-emitter arrays for lithography
Journal article -
TF Teepen
,
H van 't Spijker
,
S. Steenbrink
,
A van Zuuk
,
C.T.H. Heerkens
,
N van Druten
,
M Wieland
,
P. Kruit
Shot noise in electron-beam lithography and line-width measurements
Journal article -
P. Kruit
,
S. Steenbrink
Optimum dose for shot noise limited CD uniformity in E-beam lithography
Journal article -
P. Kruit
,
S. Steenbrink
,
R. Jager
,
MJJ Wieland
Contributed
1 records found
System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
Patent -
S. Steenbrink
,
P. Kruit