Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

Magnetization losses in submicrometer CoFeB dots etched in a high ion density Cl2-based plasma

Deep dry etching process development for photonic crystals in InP-based planar waveguides

Cl2-based inductively coupled plasma etching of photonic crystals in InP,

High speed, dry etching of Fe for integration of magnetic devices in microelectronics.

Advanded dry etching for next generation thin film heads for mangentic recording.

Advanded dry etching for next generation thin film heads for mangentic recording.

High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

High Speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

High speed anisotropic dry etching of CoNbZr for next generation magnetic recording.

Advanced dry etching for next generation thin film heads for magnetic recording.

Plasma induced charging damage of gate oxides.