J Romijn | TU Delft Repository

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J Romijn

Conference paper (2)

Journal article (9)

Report (1)

12 records found

1

Epitaxial growth of a colloidal hard-sphere hcp crystal and the effects of epitaxial mismatch on crystal structure

Journal article (2004) - JP Hoogenboom (author) , A.K. van Langen-Suurling (author) , J Romijn (author) , A van Blaaderen (author)

Template-induced growth of close-packed and non-close-packed colloidal crystals during solvent evaporation

Journal article (2004) - JP Hoogenboom (author) , C Retif (author) , E de Bres (author) , mv de Boer (author) , Anja van Langen-Suurling (author) , J Romijn (author) , A van Blaaderen (author)

Hard-sphere crystals with hcp and non-close-packed structure grown by colloidal epitaxy

Journal article (2003) - JP Hoogenboom (author) , A.K. van Langen-Suurling (author) , J Romijn (author) , A van Blaaderen (author)

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

Journal article (2002) - M Peuker (author) , MH Lim (author) , HI Smith (author) , R Morton (author) , Anja van Langen-Suurling (author) , J Romijn (author) , E.W.J.M. van der Drift (author) , FCMJM van Delft (author)

Epitaxial Crystal Growth of Charged Colloids

Journal article (2002) - JP Hoogenboom (author) , A Yethiraj (author) , A.K. Van Langen-Suurling (author) , J Romijn (author) , A van Blaaderen (author)

Restructuring of Emma.

Report (2000) - J Romijn (author)

HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

Journal article (2000) - FCMJM van Delft (author) , JP Weterings (author) , A.K. Van Langen-Suurling (author) , J Romijn (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Conference paper (1999) - AJ van Dodewaard (author) , WSM Ketelaars (author) , RFM Roes (author) , JAJ Kwinten (author) , FCMJM van Delft (author) , A.J. van Run (author) , J Romijn (author) , A. K. van Langen-Suurling (author)

A compact PHASAR with low central channel loss

Conference paper (1999) - YC Zhu (author) , FH Groen (author) , DHP Maat (author) , YS Oei (author) , J Romijn (author) , I Moerman (author)

Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers

Journal article (1997) - HJ Voorma (author) , E Louis (author) , J Friedrich (author) , NB Koster (author) , LA Smaenok (author) , F Bijkerk (author) , T Zijlstra (author) , LEM de Groot (author) , EWJM van der Drift (author) , BAC Rousseeuw (author) , J Romijn (author)

Extreme UV Lithography: Development of a laser plasma source and multilayer reflective optics

Journal article (1996) - F Bijkerk (author) , LA Shmaenol (author) , T Zijlstra (author) , E Louis (author) , HJ Voorma (author) , NB Koster (author) , FA van Goor (author) , J van Spijker (author) , E.W.J.M. van der Drift (author) , J Romijn (author) , BAC Rousseeuw (author)

DUV-E-beam Mix and Match lithography in a single mask for fabricating a multi-terminal SQUID-device

Journal article (1996) - BJ Vleeming (author) , JTLR Leene (author) , EWJM van der Drift (author) , J Romijn (author)