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J Friedrich
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Fabrication and analysis of Exteme Ultra-violet reflection masks with patterned W/C absorber bilayers
Journal article -
HJ Voorma
,
E Louis
,
J Friedrich
,
NB Koster
,
LA Smaenok
,
F Bijkerk
,
T Zijlstra
,
LEM de Groot
,
E.W.J.M. van der Drift
,
BAC Rousseeuw
,
J Romijn