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W. Besling
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Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias
Conference paper -
M Saadaoui
,
H.W. van Zeijl
,
Pasqualina M Sarro
,
HTM Pham
,
HC MKnoops
,
WMM Kessels
,
MCM van de Sanden
,
F Roozeboom
,
Y Lamy
,
KB Jinesh
,
W. Besling