Pristine nanodiamonds (NDs) obtained by detonation, or functionalized by different treatments, namely oxidation, hydrogenation and amination, were used to synthesize composites by insertion in TiO2 matrixes. The different treatments of the NDs lead to materials containing diverse texture properties and surface chemistry functionalities, particularly concerning the insertion of nitrogen and oxygen groups. The photocatalytic activity of the prepared composites was evaluated for the oxidative degradation of two water soluble pharmaceuticals – diphenhydramine and amoxicillin – under near-UV/Vis irradiation. The most active photocatalyst in what concerns both pollutants degradation under near-UV/Vis irradiation was the composite containing pristine NDs (NDDT). The photocatalytic performances were dependent on the specific surface area and on the amount of functional groups incorporated over the NDs. The influence of ND in the composites activity is well correlated with the observed photoluminescence quenching of TiO2, which corresponds to a delay in the recombination rate of charge carriers that benefices the photocatalytic reaction. Scavenging of photogenerated holes and radicals by employing sacrificial hole and radical agents revealed that the holes played the main role on both pollutants degradation under UV/Vis irradiation. Reutilization experiments proved that the ND composites have good stability and reusability.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Conventional wastewater treatment has a limited capacity to reduce antibiotic resistant bacteria and genes (ARB&ARG). Tertiary treatment processes are promising solutions, although the transitory inactivation of bacteria may select ARB&ARG. This study aimed at assessing the potential of ozonation and UV254 nm radiation to inactivate cultivable fungal and bacterial populations, and the selected genes 16S rRNA (common to all bacteria), intI1 (common in Gram-negative bacteria) and the ARG vanA, blaTEM, sul1 and qnrS. The abundance of the different microbiological parameters per volume of wastewater was reduced by ∼ 2 log units for cultivable fungi and 16S rRNA and intI1 genes, by ∼3–4 log units, for total heterotrophs, enterobacteria and enterococci, and to values close or below the limits of quantification for ARG, for both processes, after a contact time of 30 min. Yet, most of the cultivable populations, the 16S rRNA and intI1 genes as well as the ARG, except qnrS after ozonation, reached pre-treatment levels after 3 days storage, suggesting a transitory rather than permanent microbial inactivation. Noticeably, normalization per 16S rRNA gene evidenced an increase of the ARG and intI1 prevalence, mainly after UV254 nm treatment. The results suggest that these tertiary treatments may be selecting for ARB&ARG populations.@en

Disinfection processes aim at reducing the number of viable cells through the generation of damages in different cellular structures and molecules. Since disinfection involves unspecific mechanisms, some microbial populations may be selected due to resilience to treatment and/or to high post-treatment fitness. In this study, the bacterial community composition of secondarily treated urban wastewater and of surface water collected in the intake area of a drinking water treatment plant was compared before and 3-days after disinfection with ultraviolet radiation, ozonation or photocatalytic ozonation. The aim was to assess the dynamics of the bacterial communities during regrowth after disinfection. In all the freshly collected samples, Proteobacteria and Bacteroidetes were the predominant phyla (40–50% and 20–30% of the reads, respectively). Surface water differed from wastewater mainly in the relative abundance of Actinobacteria (17% and < 5% of the reads, respectively). After 3-days storage at light and room temperature, disinfected samples presented a shift of Gammaproteobacteria (from 8 to 10% to 33–65% of the reads) and Betaproteobacteria (from 14 to 20% to 31–37% of the reads), irrespective of the type of water and disinfection process used. Genera such as Pseudomonas, Acinetobacter or Rheinheimera presented a selective advantage after water disinfection. These variations were not observed in the non-disinfected controls. Given the ubiquity and genome plasticity of these bacteria, the results obtained suggest that disinfection processes may have implications on the microbiological quality of the disinfected water.@en

In this work, the use of nanodiamonds (NDs; 2-10 nm) in the seeding of diamond films grown by chemical vapor deposition (CVD) and in the synthesis of composite TiO2-nanodiamond photocatalysts is discussed. First, enhanced growth of faceted, nanocrystalline diamond (NCD) films by hot filament CVD at moderate substrate temperature (650°C) and carbon-lean gas chemistry (1.0% CH4 in H2) is demonstrated. The enhancement of diamond nucleation and growth on Si substrates is achieved by using a sputter deposition of different metallic (Cr, Nb, Ti, V, and W) nanolayers and an ultrasonic seeding with NDs. We conclude that the kinetics of diamond nucleation in the NCD film growth is determined by the number density of NDs embedded on the nanorough metallic surfaces after ultrasonic pretreatment and by the specific surface chemistry (i.e., carbon diffusivity and carburization) during diamond growth. Second., the synthesis and application of composites based on microdiamonds and NDs for the photocatalytic degradation of diphenhydramine pharmaceutical water pollutant is demonstrated. Micro- A nd nanodiamond powders were combined with TiO2, varying the carbon phase content and tested as composite photocatalysts under near UV-Vis irradiation. The thus prepared composites exhibited higher photocatalytic activity than the respective bare materials. Best photocatalytic performance was observed in the case of using composites with 15 wt.% of NDs oxidized in air at 703 K.@en

In this work, the use of nanodiamonds (NDs; 2-10 nm) in the seeding of diamond films grown by chemical vapor deposition (CVD) and in the synthesis of composite TiO2-nanodiamond photocatalysts is discussed. First, enhanced growth of faceted, nanocrystalline diamond (NCD) films by hot filament CVD at moderate substrate temperature (650°C) and carbon-lean gas chemistry (1.0% CH4 in H2) is demonstrated. The enhancement of diamond nucleation and growth on Si substrates is achieved by using a sputter deposition of different metallic (Cr, Nb, Ti, V, and W) nanolayers and an ultrasonic seeding with NDs. We conclude that the kinetics of diamond nucleation in the NCD film growth is determined by the number density of NDs embedded on the nanorough metallic surfaces after ultrasonic pretreatment and by the specific surface chemistry (i.e., carbon diffusivity and carburization) during diamond growth. Second., the synthesis and application of composites based on microdiamonds and NDs for the photocatalytic degradation of diphenhydramine pharmaceutical water pollutant is demonstrated. Micro- A nd nanodiamond powders were combined with TiO2, varying the carbon phase content and tested as composite photocatalysts under near UV-Vis irradiation. The thus prepared composites exhibited higher photocatalytic activity than the respective bare materials. Best photocatalytic performance was observed in the case of using composites with 15 wt.% of NDs oxidized in air at 703 K.@en

In this work, the use of nanodiamonds (NDs; 2-10 nm) in the seeding of diamond films grown by chemical vapor deposition (CVD) and in the synthesis of composite TiO2-nanodiamond photocatalysts is discussed. First, enhanced growth of faceted, nanocrystalline diamond (NCD) films by hot filament CVD at moderate substrate temperature (650°C) and carbon-lean gas chemistry (1.0% CH4 in H2) is demonstrated. The enhancement of diamond nucleation and growth on Si substrates is achieved by using a sputter deposition of different metallic (Cr, Nb, Ti, V, and W) nanolayers and an ultrasonic seeding with NDs. We conclude that the kinetics of diamond nucleation in the NCD film growth is determined by the number density of NDs embedded on the nanorough metallic surfaces after ultrasonic pretreatment and by the specific surface chemistry (i.e., carbon diffusivity and carburization) during diamond growth. Second., the synthesis and application of composites based on microdiamonds and NDs for the photocatalytic degradation of diphenhydramine pharmaceutical water pollutant is demonstrated. Micro- A nd nanodiamond powders were combined with TiO2, varying the carbon phase content and tested as composite photocatalysts under near UV-Vis irradiation. The thus prepared composites exhibited higher photocatalytic activity than the respective bare materials. Best photocatalytic performance was observed in the case of using composites with 15 wt.% of NDs oxidized in air at 703 K.@en

In this work, the use of nanodiamonds (NDs; 2-10 nm) in the seeding of diamond films grown by chemical vapor deposition (CVD) and in the synthesis of composite TiO2-nanodiamond photocatalysts is discussed. First, enhanced growth of faceted, nanocrystalline diamond (NCD) films by hot filament CVD at moderate substrate temperature (650°C) and carbon-lean gas chemistry (1.0% CH4 in H2) is demonstrated. The enhancement of diamond nucleation and growth on Si substrates is achieved by using a sputter deposition of different metallic (Cr, Nb, Ti, V, and W) nanolayers and an ultrasonic seeding with NDs. We conclude that the kinetics of diamond nucleation in the NCD film growth is determined by the number density of NDs embedded on the nanorough metallic surfaces after ultrasonic pretreatment and by the specific surface chemistry (i.e., carbon diffusivity and carburization) during diamond growth. Second., the synthesis and application of composites based on microdiamonds and NDs for the photocatalytic degradation of diphenhydramine pharmaceutical water pollutant is demonstrated. Micro- A nd nanodiamond powders were combined with TiO2, varying the carbon phase content and tested as composite photocatalysts under near UV-Vis irradiation. The thus prepared composites exhibited higher photocatalytic activity than the respective bare materials. Best photocatalytic performance was observed in the case of using composites with 15 wt.% of NDs oxidized in air at 703 K.@en

In this work, the use of nanodiamonds (NDs; 2-10 nm) in the seeding of diamond films grown by chemical vapor deposition (CVD) and in the synthesis of composite TiO2-nanodiamond photocatalysts is discussed. First, enhanced growth of faceted, nanocrystalline diamond (NCD) films by hot filament CVD at moderate substrate temperature (650°C) and carbon-lean gas chemistry (1.0% CH4 in H2) is demonstrated. The enhancement of diamond nucleation and growth on Si substrates is achieved by using a sputter deposition of different metallic (Cr, Nb, Ti, V, and W) nanolayers and an ultrasonic seeding with NDs. We conclude that the kinetics of diamond nucleation in the NCD film growth is determined by the number density of NDs embedded on the nanorough metallic surfaces after ultrasonic pretreatment and by the specific surface chemistry (i.e., carbon diffusivity and carburization) during diamond growth. Second., the synthesis and application of composites based on microdiamonds and NDs for the photocatalytic degradation of diphenhydramine pharmaceutical water pollutant is demonstrated. Micro- A nd nanodiamond powders were combined with TiO2, varying the carbon phase content and tested as composite photocatalysts under near UV-Vis irradiation. The thus prepared composites exhibited higher photocatalytic activity than the respective bare materials. Best photocatalytic performance was observed in the case of using composites with 15 wt.% of NDs oxidized in air at 703 K.@en

In this work, the use of nanodiamonds (NDs; 2-10 nm) in the seeding of diamond films grown by chemical vapor deposition (CVD) and in the synthesis of composite TiO2-nanodiamond photocatalysts is discussed. First, enhanced growth of faceted, nanocrystalline diamond (NCD) films by hot filament CVD at moderate substrate temperature (650°C) and carbon-lean gas chemistry (1.0% CH4 in H2) is demonstrated. The enhancement of diamond nucleation and growth on Si substrates is achieved by using a sputter deposition of different metallic (Cr, Nb, Ti, V, and W) nanolayers and an ultrasonic seeding with NDs. We conclude that the kinetics of diamond nucleation in the NCD film growth is determined by the number density of NDs embedded on the nanorough metallic surfaces after ultrasonic pretreatment and by the specific surface chemistry (i.e., carbon diffusivity and carburization) during diamond growth. Second., the synthesis and application of composites based on microdiamonds and NDs for the photocatalytic degradation of diphenhydramine pharmaceutical water pollutant is demonstrated. Micro- A nd nanodiamond powders were combined with TiO2, varying the carbon phase content and tested as composite photocatalysts under near UV-Vis irradiation. The thus prepared composites exhibited higher photocatalytic activity than the respective bare materials. Best photocatalytic performance was observed in the case of using composites with 15 wt.% of NDs oxidized in air at 703 K.@en