JA Diniz | TU Delft Repository

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Journal article (2008) - C Biasotto (author) , JA Diniz (author) , AM Daltrini (author) , SA Moshkalev (author) , MJR Monteiro (author)

Deposition of sacrificial silicon oxide layers by electron cyclotron resonance plasma

Journal article (2007) - C Biasotto (author) , AM Daltrini (author) , RC Teixeira (author) , FA Boscoli (author) , JA Diniz (author) , SA Moshkalev (author) , I Doi (author)

Investigation and characterization of silicon nitride thin films deposited by ECR-CVD plasma for Microelectromechanical systems application

Journal article (2007) - C Biasotto (author) , JA Diniz (author) , AM Daltrini (author) , SA Moshkalyov (author) , MJR Monteiro (author)