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Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Matsuyama, T. (author), Noda, T. (author)
Phase Measurement Interferometers (PMI) are widely used during the manufacturing process of high quality lenses. Although they have an excellent reproducibility and sensitivity, the set-up is expensive and the accuracy of the measurement needs to be checked frequently. This paper discusses an alternative lens metrology method that is based on an...
conference paper 2006
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Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author) journal article 2006
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Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van Haver, S. (author), Van de Nes, A.S. (author)
The judgment of the imaging quality of an optical system can be carried out by examining its through-focus intensity distribution. It has been shown in a previous paper that a scalar-wave analysis of the imaging process according to the extended Nijboer–Zernike theory allows the retrieval of the complex pupil function of the imaging system,...
journal article 2005
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Dirksen, P. (author), Braat, J.J.M. (author), Janssen, A.J.E.M. (author), Leeuwesteijn, A. (author) conference paper 2005
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Braat, J.J.M. (author), Dirksen, P. (author), Janssen, A.J.E.M. (author), Van de Nes, A.S. (author)
Poster presentation with Philips Research Laboratories
journal article 2004
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Dirksen, P. (author), Braat, J. (author), Janssen, A.J.E.M. (author), Leeuwestein, A. (author), Kwinten, H. (author), Van Steenwinckel, D. (author)
This study presents an experimental method to determine the resist parameters that are at the origin of a general blurring of the projected aerial image. The resist model includes the effects of diffusion in the horizontal plane and a second cause for image blur that originates from a stochastic variation of the focus parameter. The used...
conference paper 2004
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