Ptychographic imaging ellipsometry using visible and extreme ultraviolet light
Matthias Gouder (Vrije Universiteit Amsterdam, Advanced Research Center for Nanolithography, Amsterdam)
Fengling Zhang (Vrije Universiteit Amsterdam, Advanced Research Center for Nanolithography, Amsterdam)
Antonios Pelekanidis (Advanced Research Center for Nanolithography, Amsterdam, Vrije Universiteit Amsterdam)
Lars Loetgering (Carl Zeiss)
Stefan Witte (TU Delft - Applied Sciences, Advanced Research Center for Nanolithography, Amsterdam, Vrije Universiteit Amsterdam)
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Abstract
We show how to utilize ptychographic measurements in reflection, to obtain maps of height and complex refractive indices, using visible and extreme ultraviolet light sources. This technique enables flexible, high-resolution imaging of multi-element microstructures.