Understanding and Controlling the Aggregative Growth of Platinum Nanoparticles in Atomic Layer Deposition
an Avenue to Size Selection
Fabio Grillo (TU Delft - ChemE/Product and Process Engineering)
Hao Bui (TU Delft - ChemE/Product and Process Engineering)
J.A. Moulijn (TU Delft - ChemE/Catalysis Engineering)
M.T. Kreutzer (TU Delft - ChemE/Chemical Engineering)
J. R. Van Ommen (TU Delft - ChemE/Product and Process Engineering)
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Abstract
We present an atomistic understanding of the evolution of the size distribution with temperature and number of cycles in atomic layer deposition (ALD) of Pt nanoparticles (NPs). Atomistic modeling of our experiments teaches us that the NPs grow mostly via NP diffusion and coalescence rather than through single-atom processes such as precursor chemisorption, atom attachment, and Ostwald ripening. In particular, our analysis shows that the NP aggregation takes place during the oxygen half-reaction and that the NP mobility exhibits a size- and temperature-dependent scaling. Finally, we show that contrary to what has been widely reported, in general, one cannot simply control the NP size by the number of cycles alone. Instead, while the amount of Pt deposited can be precisely controlled over a wide range of temperatures, ALD-like precision over the NP size requires low deposition temperatures (e.g., T < 100 °C) when growth is dominated by atom attachment.
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