Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls

Conference Paper (2009)
Author(s)

C Shen (TU Delft - Electronic Components, Technology and Materials)

HTM Pham (TU Delft - Old - EWI Sect. ECTM)

PM Sarro (TU Delft - Electronic Components, Technology and Materials)

Research Group
Electronic Components, Technology and Materials
More Info
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Publication Year
2009
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1071-1074

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