Alignment insensitive anisotropic etching of silicon cavities with smooth 49° sidewalls
Conference Paper
(2009)
Author(s)
C Shen (TU Delft - Electronic Components, Technology and Materials)
HTM Pham (TU Delft - Old - EWI Sect. ECTM)
PM Sarro (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
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https://resolver.tudelft.nl/uuid:1f257366-74a2-47cc-90c3-e62a370a30e7
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Publication Year
2009
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1071-1074
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