Amorphous topological phases protected by continuous rotation symmetry
H. Spring (Kavli institute of nanoscience Delft, TU Delft - QN/Akhmerov Group)
Anton Akhmerov (TU Delft - QN/Akhmerov Group, Kavli institute of nanoscience Delft)
Daniel Varjas (TU Delft - QRD/Kouwenhoven Lab, Stockholm University, Kavli institute of nanoscience Delft, TU Delft - QuTech Advanced Research Centre)
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Abstract
Protection of topological surface states by reflection symmetry breaks down when the boundary of the sample is misaligned with one of the high symmetry planes of the crystal. We demonstrate that this limitation is removed in amorphous topological materials, where the Hamiltonian is invariant on average under reflection over any axis due to continuous rotation symmetry. We show that the edge remains protected from localization in the topological phase, and the local disorder caused by the amorphous structure results in critical scaling of the transport in the system. In order to classify such phases we perform a systematic search over all the possible symmetry classes in two dimensions and construct the example models realizing each of the proposed topological phases. Finally, we compute the topological invariant of these phases as an integral along a meridian of the spherical Brillouin zone of an amorphous Hamiltonian.
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