Nanoparticle detection limits of TNO's Rapid Nano

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Nanoparticle detection limits of TNO's Rapid Nano

Modeling and experimental results

Conference Paper (2012)

Author(s)

Peter Van Der Walle (TNO)

Pragati Kumar (TNO)

Dmitry Ityaksov (TNO)

Richard Versluis (TNO)

Diederik J. Maas (TNO)

Olaf Kievit (TNO)

Jochem Janssen (TNO)

Jacques C.J. Van Der Donck (TNO)

Affiliation

External organisation

BRDF Modeling Qualification EUV Speckle Particle inspection Detection limit Rapid Nano

DOI related publication

https://doi.org/10.1117/12.2006408 Final published version

To reference this document use

https://resolver.tudelft.nl/uuid:30b44072-2fb1-45bc-9b3e-2c47d6c2dc5e

More Info

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Publication Year

2012

Language

English

Affiliation

External organisation

Article number

2006408

Publisher

SPIE

ISBN (electronic)

9780819492609

Event

SPIE Conference on Photomask Technology 2012 (2012-09-11 - 2012-09-13), Monterey, United States

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Abstract

TNO has developed the Rapid Nano scanner to detect nanoparticles on EUVL mask blanks. This scanner was designed to be used in particle qualifications of EUV reticle handling equipment. In this paper we present an end-to-end model of the Rapid Nano detection process. All important design parameters concerning illumination, detection and noise are included in the model. The prediction from the model matches the performance that was experimentally determined (59 nm LSE). The model will be used to design and predict the performance of future generations of particle scanners.