Reaction mechanism and kinetics of boron removal from molten silicon via CaO-SiO2-CaCl2 slag treatment and ammonia injection

Journal Article (2019)
Authors

Hui Chen (Sichuan University, University of Tokyo)

Xizhi Yuan (Sichuan University)

Kazuki Morita (University of Tokyo)

Yanjun Zhong (Sichuan University)

Xiaodong Ma (University of Queensland)

Z. Chen ((OLD) MSE-3)

Ye Wang (Sichuan University)

Research Group
(OLD) MSE-3
To reference this document use:
https://doi.org/10.1007/s11663-019-01639-4
More Info
expand_more
Publication Year
2019
Language
English
Research Group
(OLD) MSE-3
Issue number
5
Volume number
50
Pages (from-to)
2088-2094
DOI:
https://doi.org/10.1007/s11663-019-01639-4

Abstract

To improve the boron-removal efficiency of metallurgical-grade silicon by increasing the reaction rate, a combined method with the 30 mol pct CaO-23.3 mol pct SiO2-46.7 mol pct CaCl2 slag treatment and ammonia injection at 1723 K to 1823 K was proposed. For 1 hour and at 1823 K, the maximum removal efficiency of boron was 98 pct, and the final boron concentration in silicon decreased to 1.5 ppmw by the present method without the introduction of the iron catalyst. A kinetic model was also established to clarify the reaction mechanism and rate-limiting steps of this complicated boron-removal process. In this model, the rate-limiting step is the mass transfer of boron oxide at the interface between the slag and silicon phase.

No files available

Metadata only record. There are no files for this record.