Chemical vapor deposition of Ga dopants for fabricating ultrashallow p-n junctions at 400 *C
Conference Paper
(2010)
Author(s)
A. Sammak (TU Delft - Electronic Components, Technology and Materials)
L Qi (External organisation)
Wiebe De Boer (TU Delft - Electronic Components, Technology and Materials)
L.K. Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1109/ICSICT.2010.5667503
To reference this document use:
https://resolver.tudelft.nl/uuid:336af278-e895-4bce-8847-e22afe6abb9e
More Info
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Publication Year
2010
Language
English
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
969-971
ISBN (print)
978-1-4244-5797-7
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