Trajectory displacement effect in particle projection Lithography systems - Modifications to the Extended Two-Particle Theory and Monte Carlo Simulation Technique
Journal Article
(1998)
Author(s)
GH Jansen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
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Publication Year
1998
Research Group
ImPhys/Charged Particle Optics
Issue number
8
Volume number
84
Pages (from-to)
4549-4567
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