A novel electrochemical etching technique for n-type silicon
Journal Article
(2002)
Author(s)
S Izuo (External organisation)
H Ohji (TU Delft - Electronic Instrumentation)
P.J. French (TU Delft - Electronic Instrumentation)
K Tsutsumi (External organisation)
Research Group
Electronic Instrumentation
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https://resolver.tudelft.nl/uuid:3f43ad2c-1b24-4092-91d5-d6b4b366148e
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Publication Year
2002
Research Group
Electronic Instrumentation
Volume number
A 97-98
Pages (from-to)
720-724
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