A novel electrochemical etching technique for n-type silicon

Journal article (2002)

Authors

S Izuo External organisation
H Ohji Electronic Instrumentation - EEMCS
P.J. French Electronic Instrumentation - EEMCS
K Tsutsumi External organisation
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
More Info
expand_more

Published Date

2002

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation