Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based divices

Journal article (1997)

Authors

JWH Maes Old organisation TN/TechnischeNatuurkunde voorm
PW Lukey External organisation
T Zijlstra QN/Kavli Nanolab Delft - AS
CCG Visser External organisation
J. Caro-Schuurman QN/Fysics of NanoElectronics
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
F.D. Tichelaar OLD Virtual Materials and Mechanics
S Radelaar OLD Metals Processing, Microstructures and Properties
Department
Old organisation TN/TechnischeNatuurkunde voorm
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Published Date

1997

Language

Undefined/Unknown

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Department

Old organisation TN/TechnischeNatuurkunde voorm