Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based divices

Journal Article (1997)
Author(s)

JWH Maes (TU Delft - Old organisation TN/TechnischeNatuurkunde voorm)

PW Lukey (External organisation)

T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)

CCG Visser (External organisation)

J Caro (TU Delft - QN/Fysics of NanoElectronics)

Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)

Frans D. Tichelaar (TU Delft - OLD Virtual Materials and Mechanics)

S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)

Department
Old organisation TN/TechnischeNatuurkunde voorm
More Info
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Publication Year
1997
Department
Old organisation TN/TechnischeNatuurkunde voorm
Volume number
35
Pages (from-to)
321-324

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