Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks

Weppelman, I.G.C.; Post, P.C.; Heerkens, C.T.H.; Hagen, C.W.; Hoogenboom, Jacob P.

Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks

Journal article (2016)

Authors

I.G.C. Weppelman ImPhys/Microscopy Instrumentation & Techniques -

P.C. Post ImPhys/Microscopy Instrumentation & Techniques -

C.T.H. Heerkens ImPhys/Microscopy Instrumentation & Techniques -

C.W. Hagen ImPhys/Microscopy Instrumentation & Techniques -

Jacob P. Hoogenboom ImPhys/Microscopy Instrumentation & Techniques -

Research Group

ImPhys/Microscopy Instrumentation & Techniques () (TU Delft)

Nanostructures Masks EBID Dry etching

To reference this document use:

http://resolver.tudelft.nl/uuid:54aa95a2-1ee8-4c5d-9cce-73319a2404f6

More Info

expand_more

Published Date

2016

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Microscopy Instrumentation & Techniques

Files

1_s2.0_S0167931716300314_main.... (pdf)

(pdf | 1.38 Mb)

Unknown license

Download not available