Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks
Journal Article
(2016)
Author(s)
I.G.C. Weppelman (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
P.C. Post (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
C.T.H. Heerkens (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
CW Hagen (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
JP Hoogenboom (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
Research Group
ImPhys/Microscopy Instrumentation & Techniques
DOI related publication
https://doi.org/10.1016/j.mee.2016.01.031
To reference this document use:
https://resolver.tudelft.nl/uuid:54aa95a2-1ee8-4c5d-9cce-73319a2404f6
More Info
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Publication Year
2016
Language
English
Research Group
ImPhys/Microscopy Instrumentation & Techniques
Volume number
153
Pages (from-to)
77-82
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