Thin film silicon devices deposited at 100 degrees C: A study on the structural order of the photoactive layer
Journal Article
(2008)
Author(s)
JK Rath (External organisation)
REI Schropp (External organisation)
PRI Caborocas (External organisation)
F.D. Tichelaar (QN/High Resolution Electron Microscopy)
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Publication Year
2008
Issue number
19-25
Volume number
354
Pages (from-to)
2652-2656
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