Thin film silicon devices deposited at 100 degrees C: A study on the structural order of the photoactive layer

Journal article (2008)

Authors

JK Rath External organisation
REI Schropp External organisation
PRI Caborocas External organisation
F.D. Tichelaar QN/High Resolution Electron Microscopy
Research Group
QN/High Resolution Electron Microscopy
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Published Date

2008

Language

Undefined/Unknown

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Research Group

QN/High Resolution Electron Microscopy