Inverse Electromagnetics for EUV mask metrology and inspection

Doctoral thesis (2022)

Authors

P. Ansuinelli ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
Copyright: © 2022 P. Ansuinelli
DOI
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https://doi.org/10.4233/uuid:7c5d0326-c293-4f5a-a926-edf7358f6510
Phase retrieval Scatterometry Inverse problems EUV mask inspection and metrology
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Published Date

2022

Language

English

Reuse Rights

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics

Abstract

The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on top of an extreme ultraviolet (EUV) lithographic mask...

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PA_thesis.pdf
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