Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition

Usui, T; Donelly, CA; Logar, M; Sinclair, R; Schoonman, Joop; Prinz, FB

Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition

Journal article (2013)

Authors

T Usui External organisation

CA Donelly External organisation

M Logar External organisation

R Sinclair External organisation

Joop Schoonman ChemE/Materials for Energy Conversion and Storage

FB Prinz External organisation

Research Group

ChemE/Materials for Energy Conversion and Storage

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Published Date

2013

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Research Group

ChemE/Materials for Energy Conversion and Storage

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