Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition
Journal Article
(2013)
Author(s)
T Usui (External organisation)
CA Donelly (External organisation)
M Logar (External organisation)
R Sinclair (External organisation)
J Schoonman (TU Delft - ChemE/Materials for Energy Conversion and Storage)
FB Prinz (External organisation)
Research Group
ChemE/Materials for Energy Conversion and Storage
DOI related publication
https://doi.org/10.1016/j.actamat.2013.09.003
To reference this document use:
https://resolver.tudelft.nl/uuid:7d3cb1bb-3663-4faa-9930-a12b378afab1
More Info
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Publication Year
2013
Research Group
ChemE/Materials for Energy Conversion and Storage
Issue number
20
Volume number
61
Pages (from-to)
7660-7670
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