Review Article
Recommended reading list of early publications on atomic layer deposition - Outcome of the "virtual Project on the History of ALD"
Esko Ahvenniemi (Aalto University)
Andrew R. Akbashev (Stanford University)
Saima Ali (Aalto University)
Mikhael Bechelany (ENS-PSL Research University & CNRS)
Maria Berdova (University of Twente)
Stefan Boyadjiev (Bulgarian Academy of Sciences)
David C. Cameron (Masaryk University)
Rong Chen (Huazhong University of Science and Technology, TU Delft - Railway Engineering, School of Mechanical Science and Engineering)
Mikhail Chubarov (Université Grenoble Alpes)
Veronique Cremers (Universiteit Gent)
Anjana Devi (Center for Interface-Dominated High Performance Materials)
Viktor Drozd (Institute of Translational Biomedicine)
Liliya Elnikova (Institute for Theoretical and Experimental Physics)
Gloria Gottardi (Fondazione Bruno Kessler)
Kestutis Grigoras (VTT Technical Research Center of Finland)
Dennis M. Hausmann (Lam Research Corporation)
Cheol Seong Hwang (Seoul National University)
Shih Hui Jen (Globalfoundries)
Tanja Kallio (Aalto University)
Jaana Kanervo (Åbo Akademi University, Aalto University)
Ivan Khmelnitskiy (Saint Petersburg Electrotechnical University LETI)
Do Han Kim (Massachusetts Institute of Technology)
Lev Klibanov (Techinsights)
Yury Koshtyal (Ioffe Institute)
A. Outi I Krause (Aalto University)
Jakob Kuhs (Universiteit Gent)
Irina Kärkkänen (SENTECH Instruments GmbH)
Marja Leena Kääriäinen (NovaldMedical Ltd. Oy)
Tommi Kääriäinen (NovaldMedical Ltd. Oy, Viikki Biocenter 1)
Luca Lamagna (STMicroelectronics)
Adam A. Łapicki (Seagate Technology (Ireland))
Markku Leskelä (Viikki Biocenter 1)
Harri Lipsanen (Aalto University)
Jussi Lyytinen (Aalto University)
Anatoly Malkov (St. Petersburg State Institute of Technology)
Anatoly Malygin (St. Petersburg State Institute of Technology)
Abdelkader Mennad (CDER)
Christian Militzer (Technische Universität Chemnitz)
Jyrki Molarius (Summa Semiconductor Oy)
Małgorzata Norek (Military University of Technology)
Çaǧla Özgit-Akgün (ASELSAN Inc.)
Mikhail Panov (Saint Petersburg Electrotechnical University LETI)
Henrik Pedersen (Linköping University)
Fabien Piallat (KOBUS)
Georgi Popov (Viikki Biocenter 1)
Riikka L. Puurunen (VTT Technical Research Center of Finland)
Geert Rampelberg (Universiteit Gent)
Robin H A Ras (Aalto University)
Erwan Rauwel (Tallinn University of Technology)
Fred Roozeboom (TNO, Eindhoven University of Technology)
Timo Sajavaara (University of Jyväskylä)
Hossein Salami (University of Maryland)
Hele Savin (Aalto University)
Nathanaelle Schneider (Institut de recherche et développement sur l’énergie photovoltaïque (IRDEP-CNRS), Institut Photovoltaique d'Ile-de-France (IPVF) - Site Antony)
Thomas E. Seidel (Seitek50)
Jonas Sundqvist (Fraunhofer-Institut für Keramische Technologien und Systeme IKTS)
Dmitry B. Suyatin (Lund University)
Tobias Törndahl (Uppsala University)
J. Ruud Van Ommen (TU Delft - ChemE/Product and Process Engineering)
Claudia Wiemer (Istituto per la microelettronica e microsistemi, Consiglio Nazionale delle Ricerche)
Oili M E Ylivaara (VTT Technical Research Center of Finland)
Oksana Yurkevich (Immanuel Kant Baltic Federal University)
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Abstract
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.
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