Fabrication of Devices and Antennas for Millimeter-Wave and Terahertz Systems

Conference paper (2019)

Authors

Choonsup Lee California Institute of Technology
D. Gonzalez-Ovejero CentraleSupelec-IETR UMR 6164
M. Alonso Del Pino California Institute of Technology
T. Reck California Institute of Technology
Alejandro Peralta California Institute of Technology
I. Mehdi California Institute of Technology
G. Chattopadhyay California Institute of Technology
Affiliation
External organisation
Heterodyne Submillimeter wave Corrugated Antenna Deep silicon etching Silicon Platelets
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Published Date

25-01-2019

Language

English

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Abstract

We have demonstrated corrugated horn antennas at 340 GHz and 560 GHz fabricated with deep reactive ion etching (DRIE) process on silicon. The measurement of a single 340 GHz antenna showed that the return loss and gain are approximately 25 dB and 21 dBi, respectively. The measurement of two of the 2x2 560 GHz array antenna showed that the return loss and directivity are 13 dB and 22 dB, respectively. All of the measured antennas had below -25 dB of the cross-polarization and symmetrical beam patterns. The silicon microfabrication technique allows fabrication of hundreds of horn antennas at once, allowing construction of multi-pixel heterodyne imagers and spectrometers at submillimeter wavelengths.