Analysis of the Inter-Stage Signal Leakage in Wide BW Low OSR and High DR CT MASH ΔΣM
Qilong Liu (Eindhoven University of Technology)
Lucien J. Breems (Eindhoven University of Technology, NXP Semiconductors)
Shagun Bajoria (NXP Semiconductors)
Muhammed Bolatkale (NXP Semiconductors, TU Delft - Electronic Instrumentation)
Chenming Zhang (NXP Semiconductors)
Georgi Radulov (Eindhoven University of Technology)
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Abstract
This paper analyzes the error mechanisms that limit the dynamic range (DR) of wide-bandwidth, low-OSR continuous-time (CT) multi-stage noise-shaping (MASH) ΔΣM and proposes a tool, the Signal Leakage Function (SLF), to optimize the architecture, and hence improving DR. The SLF provides new insights on finding the key parameters which influence the inter-stage signal leakage and thus the inter-stage gain (IG). These insights would lead not only to increasing the overall dynamic range in a very power-efficient way, but also decreasing the performance sensitivity to mismatches and other variations.
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