Analysis of the Inter-Stage Signal Leakage in Wide BW Low OSR and High DR CT MASH ΔΣM
Qilong Liu (Eindhoven University of Technology)
Lucien Breems (Eindhoven University of Technology, NXP Semiconductors)
S Bajoria (NXP Semiconductors)
M. Bolatkale (NXP Semiconductors, TU Delft - Electronic Instrumentation)
Chenming Zhang (NXP Semiconductors)
G. Radulov (Eindhoven University of Technology)
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Abstract
This paper analyzes the error mechanisms that limit the dynamic range (DR) of wide-bandwidth, low-OSR continuous-time (CT) multi-stage noise-shaping (MASH) ΔΣM and proposes a tool, the Signal Leakage Function (SLF), to optimize the architecture, and hence improving DR. The SLF provides new insights on finding the key parameters which influence the inter-stage signal leakage and thus the inter-stage gain (IG). These insights would lead not only to increasing the overall dynamic range in a very power-efficient way, but also decreasing the performance sensitivity to mismatches and other variations.
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