Analysis of the Inter-Stage Signal Leakage in Wide BW Low OSR and High DR CT MASH ΔΣM

Conference paper (2020)

Authors

Qilong Liu Eindhoven University of Technology
L Breems NXP Semiconductors, Eindhoven University of Technology
S Bajoria NXP Semiconductors
M. Bolatkale Electronic Instrumentation - EEMCS , NXP Semiconductors
Chenming Zhang NXP Semiconductors
Georgi Radulov Eindhoven University of Technology
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
More Info
expand_more

Published Date

2020

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation

Abstract

This paper analyzes the error mechanisms that limit the dynamic range (DR) of wide-bandwidth, low-OSR continuous-time (CT) multi-stage noise-shaping (MASH) ΔΣM and proposes a tool, the Signal Leakage Function (SLF), to optimize the architecture, and hence improving DR. The SLF provides new insights on finding the key parameters which influence the inter-stage signal leakage and thus the inter-stage gain (IG). These insights would lead not only to increasing the overall dynamic range in a very power-efficient way, but also decreasing the performance sensitivity to mismatches and other variations.

Files

09180951.pdf
(.pdf | 0.688 Mb)