Analysis of the Inter-Stage Signal Leakage in Wide BW Low OSR and High DR CT MASH ΔΣM

Conference Paper (2020)
Author(s)

Qilong Liu (Eindhoven University of Technology)

Lucien Breems (Eindhoven University of Technology, NXP Semiconductors)

S Bajoria (NXP Semiconductors)

M. Bolatkale (NXP Semiconductors, TU Delft - Electronic Instrumentation)

Chenming Zhang (NXP Semiconductors)

G. Radulov (Eindhoven University of Technology)

Research Group
Electronic Instrumentation
DOI related publication
https://doi.org/10.1109/ISCAS45731.2020.9180951
More Info
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Publication Year
2020
Language
English
Research Group
Electronic Instrumentation
Pages (from-to)
1-5
ISBN (print)
978-1-7281-3321-8
ISBN (electronic)
978-1-7281-3320-1

Abstract

This paper analyzes the error mechanisms that limit the dynamic range (DR) of wide-bandwidth, low-OSR continuous-time (CT) multi-stage noise-shaping (MASH) ΔΣM and proposes a tool, the Signal Leakage Function (SLF), to optimize the architecture, and hence improving DR. The SLF provides new insights on finding the key parameters which influence the inter-stage signal leakage and thus the inter-stage gain (IG). These insights would lead not only to increasing the overall dynamic range in a very power-efficient way, but also decreasing the performance sensitivity to mismatches and other variations.

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