Characterization of top-gated Si/SiGe devices for spin qubit applications

Conference Paper (2019)
Authors

Fabio Ansaloni (University of Copenhagen)

C. Volk (Kavli institute of nanoscience Delft, University of Copenhagen, TU Delft - QCD/Vandersypen Lab, TU Delft - QuTech Advanced Research Centre, TU Delft Services)

Anasua Chatterjee (University of Copenhagen)

Ferdinand Kuemmeth (University of Copenhagen)

Research Group
QCD/Vandersypen Lab
To reference this document use:
https://doi.org/10.23919/SNW.2019.8782944
More Info
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Publication Year
2019
Language
English
Research Group
QCD/Vandersypen Lab
ISBN (print)
978-4-8634-8702-4
ISBN (electronic)
978-4-8634-8702-4
DOI:
https://doi.org/10.23919/SNW.2019.8782944

Abstract

Spins in gate-defined silicon quantum dots are at the forefront of solid-state qubit research. We characterize top-gated devices fabricated from Si/SiGe heterostructures, demonstrating the formation of stable double and triple quantum dots with proximal charge-sensing dots. We also demonstrate fabrication of linear dot arrays with overlapping gate technology, thereby significantly increasing the density of control electrodes relative to our single-gate-layer devices.

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