Influence of sputter pressure on magnetic and structural properties of Permalloy thin films
Sukhvinder Singh (Saarland University)
L. Abelmann (TU Delft - Bio-Electronics, Korea Institute of Science and Technology)
Haibin Gao (Saarland University)
Uwe Hartmann (Saarland University)
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Abstract
Well-defined and technically relevant domain configurations are sought in patterned magnetic thin films. We used Magnetic Force Microscopy to investigate these in square-patterned Permalloy films. The films were prepared using dc sputter deposition by varying the Argon pressure from 1.5×10−3 to 30.0×10−3 mbar. The Landau domain configuration was found in films prepared at 1.5×10−3 mbar pressure. With an increase in pressure, tulip and irregular domains were consecutively formed. Based on magnetic and structural characterizations, an increase in coercivity and a decrease in Permalloy film density were observed at the same time.