Modelling the process parameters and optimising the design of Spatial Atomic Layer Deposition
Master Thesis
(2026)
Author(s)
S. Baalbergen (TU Delft - Mechanical Engineering)
Contributor(s)
J.G. Buijnsters – Mentor (TU Delft - Mechanical Engineering)
Leon Arkesteijn – Mentor
Faculty
Mechanical Engineering
To reference this document use
https://resolver.tudelft.nl/uuid:aca406c5-90dc-4cae-8173-5ae5f7b98bed
More Info
expand_more
expand_more
Publication Year
2026
Language
English
Graduation Date
18-06-2026
Awarding Institution
Delft University of Technology
Programme
Mechanical Engineering, High-Tech Engineering
Faculty
Mechanical Engineering
Downloads counter
2
Reuse Rights
Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.
Files
_Repository_Thesis_of_Siem_Baa... (pdf)
(pdf | 0 Mb)
help_outline
warning
File under embargo until 16-06-2028