Comperative study of atomic ayer deposition and low-pressure MOCVD of copper sulfide thin films.

Meester, B; Reijnen, L; Goossens, APLM; Schoonman, J.

Comperative study of atomic ayer deposition and low-pressure MOCVD of copper sulfide thin films.

Journal article (2001)

Authors

B Meester Old - sect Laboratory Inorganic Chemistry (DCT/AC)

L Reijnen Old - sect Laboratory Inorganic Chemistry (DCT/AC)

APLM Goossens Old - sect Laboratory Inorganic Chemistry (DCT/AC)

J. Schoonman Old - sect Laboratory Inorganic Chemistry (DCT/AC)

Research Group

Old - sect Laboratory Inorganic Chemistry (DCT/AC)

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Published Date

2001

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Research Group

Old - sect Laboratory Inorganic Chemistry (DCT/AC)