Comperative study of atomic ayer deposition and low-pressure MOCVD of copper sulfide thin films.
Journal Article
(2001)
Author(s)
B Meester (TU Delft - Old - sect Laboratory Inorganic Chemistry (DCT/AC))
L Reijnen (TU Delft - Old - sect Laboratory Inorganic Chemistry (DCT/AC))
APLM Goossens (TU Delft - Old - sect Laboratory Inorganic Chemistry (DCT/AC))
J Schoonman (TU Delft - Old - sect Laboratory Inorganic Chemistry (DCT/AC))
Research Group
Old - sect Laboratory Inorganic Chemistry (DCT/AC)
To reference this document use:
https://resolver.tudelft.nl/uuid:b8ca70f9-f743-47ec-84aa-4fdd3103fbb6
More Info
expand_more
expand_more
Publication Year
2001
Research Group
Old - sect Laboratory Inorganic Chemistry (DCT/AC)
Volume number
11
No files available
Metadata only record. There are no files for this record.