Oriented Attachment and Nanorod Formation in Atomic Layer Deposition of TiO2 on Graphene Nanoplatelets
Fabio Grillo (TU Delft - ChemE/Product and Process Engineering)
D. La Zara (TU Delft - ChemE/Product and Process Engineering)
P.C.M. Mulder (TU Delft - Applied Sciences)
Michiel Kreutzer (TU Delft - ChemE/Chemical Engineering)
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Abstract
Understanding the spontaneous organization of atoms on well-defined surfaces promises to enable control over the shape and size of supported nanostructures. Atomic layer deposition (ALD) boasts atomic-scale control in the synthesis of thin films and nanoparticles. Yet, the possibility to control the shape of ALD-grown nanostructures remains mostly unexplored. Here, we report on the bottom-up formation of both linear and V-shaped anatase TiO2 nanorods (NRs) on graphene nanoplatelets during TiCl4/H2O ALD carried out at 300 °C. NRs as large as 200 nm form after only five ALD cycles, indicating that diffusional processes rather than layer-by-layer growth are behind the NR formation. In particular, high-resolution transmission electron microscopy reveals that the TiO2 NRs and graphene nanoplatelets are in rotational alignment as a result of lattice matching. Crucially, we also show that individual nanocrystals can undergo in-plane oriented attachment.
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