Modelling of the Kinetics in Copper Chemical Vapour Deposition from Cu(hfac)VTMS
Journal Article
(1999)
Author(s)
MLH ter Heerdt (External organisation)
JJ Overdijk (External organisation)
PJ van der Put (External organisation)
J. Schoonman (TU Delft - Old - sect Laboratory Inorganic Chemistry (DCT/AC))
Research Group
Old - sect Laboratory Inorganic Chemistry (DCT/AC)
To reference this document use:
https://resolver.tudelft.nl/uuid:bbd4cf11-60f7-4a07-948d-dc903106380f
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Publication Year
1999
Research Group
Old - sect Laboratory Inorganic Chemistry (DCT/AC)
Volume number
11
Pages (from-to)
3470-3475
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