Scalable production of stabilized catalysts via atomic layer deposition

Conference Paper (2015)
Author(s)

A. Goulas (Delft IMP B.V.)

A. Dokania (TU Delft - Applied Sciences)

F. Grillo (TU Delft - Applied Sciences)

J.R. van Ommen (TU Delft - Applied Sciences)

B. Van Limpt (Delft IMP B.V.)

Research Group
ChemE/Product and Process Engineering
More Info
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Publication Year
2015
Language
English
Research Group
ChemE/Product and Process Engineering
Volume number
2
Pages (from-to)
120-123
ISBN (electronic)
9781498747288
Event
10th Annual TechConnect World Innovation Conference and Expo, Held Jointly with the 18th Annual Nanotech Conference and Expo, and the 2015 National SBIR/STTR Conference (2015-06-14 - 2015-06-17), Washington, United States
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Abstract

We report the fabrication of ultrathin aluminum-based overcoats on supported platinum catalysts using atomic layer deposition and hydrid atomic/molecular layer deposition. Tuning the process parameters and applying heat treatment for porosity induction can result to controllably accesible model catalysts. We examined the effect of the number of deposition cycles (1-25), co-reactant choice (water, ethylene glycol, 1,5-pentanediol) and exposure time on the characteristics of the alumina and alucone stabilizing films. The use of fluidized bed reactors for atomic layer deposition applied for active phase deposition and overcoat stabilization paves the way for large-scale gas-phase production of tailored nanostructured catalysts.

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