What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?
Hao van Bui ( Phenikaa University, Yen Nghi)
Anh Phan Nguyen ( Phenikaa University, Yen Nghi)
Manh Duc Dang ( Phenikaa University, Yen Nghi)
Truong Duc Dinh ( Phenikaa University, Yen Nghi)
Patricia J. Kooyman (University of Cape Town)
Jan Rudolf Ruud van Ommen (TU Delft - ChemE/Product and Process Engineering)
More Info
expand_more
Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.
Abstract
We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe3 and O2. We reveal that by supplying a sufficiently high O2 exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO2 nanoparticles even at room temperature by atmospheric-pressure ALD.