Beam scanning coherent Fourier scatterometry
S. Soman (TU Delft - ImPhys/Pereira group)
Silvania Pereira (TU Delft - ImPhys/Pereira group)
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Abstract
The significance of precise metrology in various industries, particularly within manufacturing plants, is undeniable, especially as components and devices continue to undergo miniaturization. The emergence of nano-manufacturing further amplifies the necessity for meticulous measurement techniques. Coherent Fourier scatterometry (CFS) is a nonimaging, model-based, bright-field optical metrology and inspection technique used for retrieving complex geometric parameters of nanostructures and for detecting isolated nanoparticles and contamination on surfaces. It uses a focused light spot to illuminate the sample and the scattered light is collected as the sample is scanned in the lateral direction. However, the time it takes to inspect a certain area has been a limiting factor in its wider adoption as a commercial metrology tool. To address this limitation, we propose a novel design of CFS utilizing a galvo mirror for faster scanning of the laser spot on the sample, offering significant improvements in scan speed.