Determination of ion dose and profiles in 74Ge and 120Sn implanted silicon layers by PIXE, NAA RBS and SIMS
Journal Article
(2004)
Author(s)
B Belin (External organisation)
Peter Bode (TU Delft - Old - Section Radiochemistry)
R Turan (External organisation)
TG van Meerten (TU Delft - Old - Section Radiochemistry)
Research Group
Old - Section Radiochemistry
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https://resolver.tudelft.nl/uuid:d0ede0ae-f5d7-41c3-a730-2ae448434e1f
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Publication Year
2004
Research Group
Old - Section Radiochemistry
Issue number
2
Volume number
261
Pages (from-to)
479-483
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