Modeling the precursor utilization in atomic layer deposition on nanostructured materials inn fluidized bed reactors
Journal Article
(2015)
Authors
F Grillo (TU Delft - ChemE/Product and Process Engineering)
M.T. Kreutzer (TU Delft - ChemE/Product and Process Engineering)
Jan Rudolf Ruud van Ommen (TU Delft - ChemE/Product and Process Engineering)
Research Group
ChemE/Product and Process Engineering
To reference this document use:
https://doi.org/10.1016/j.cej.2015.01.067
TU Delft Repository resolver:
https://resolver.tudelft.nl/d1c296a7-d5f0-4fd4-a6b0-32413ebd1a92
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Publication Year
2015
Language
English
Research Group
ChemE/Product and Process Engineering
Issue number
15 May 2015
Volume number
268
Pages (from-to)
384-398
DOI:
https://doi.org/10.1016/j.cej.2015.01.067
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