Amplitude and phase beam shaping for highest sensitivity in sidewall angle detection

Abstract

In integrated circuits manufacturing, specific structures are used as tools to evaluate the quality of the lithographic process, and the shape of these structures is often described by a few parameters, of which in particular the sidewall angle suffers from considerable inaccuracies. Using scalar diffraction theory, we investigate whether a properly shaped cylindrically focused probing beam could increase the ability to detect tiny changes in this angle in the case of a cliff-like structure, modeled as a phase object. This paper describes the theoretical formulation used to calculate the optimized beam and compares its performance with the case of a focused plane wave.