Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices

Journal article (2011)

Authors

M Rosso ChemE/Product and Process Engineering - AS
V. van Steijn ChemE/Product and Process Engineering - AS
L.C.P.M. de Smet OLD ChemE/Organic Materials and Interfaces
Ernst J. R. Sudhölter OLD ChemE/Organic Materials and Interfaces
C.R. Kleijn MSP/Thermal & Materials Processes
M.T. Kreutzer ChemE/Product and Process Engineering - AS
Research Group
ChemE/Product and Process Engineering (AS) (TU Delft)
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Published Date

2011

Language

English

Reuse Rights

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Faculty

Applied Sciences

Department

ChemE/Chemical Engineering

Research Group

ChemE/Product and Process Engineering