Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices
Journal Article
(2011)
Author(s)
M Rosso (TU Delft - ChemE/Product and Process Engineering)
V van Steijn (TU Delft - ChemE/Product and Process Engineering)
Louis C P M de Smet (TU Delft - OLD ChemE/Organic Materials and Interfaces)
EJR Sudhölter (TU Delft - OLD ChemE/Organic Materials and Interfaces)
CR Kleijn (TU Delft - MSP/Thermal & Materials Processes)
Michiel Kreutzer (TU Delft - ChemE/Product and Process Engineering)
Research Group
ChemE/Product and Process Engineering
To reference this document use:
https://resolver.tudelft.nl/uuid:e8a95907-7500-4133-840b-8f9bdd05bdc4
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Publication Year
2011
Language
English
Research Group
ChemE/Product and Process Engineering
Volume number
98
Pages (from-to)
174102-1-174102-3
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