Objective function and adjoint sensitivities for moving-mask lithography
Conference Paper
(2008)
Author(s)
A Van Keulen (TU Delft - Computational Design and Mechanics)
Y Hirai (External organisation)
O Tabata (External organisation)
Research Group
Computational Design and Mechanics
To reference this document use:
https://resolver.tudelft.nl/uuid:f714be10-cb2b-4ed9-9a94-4c3655abc801
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Publication Year
2008
Research Group
Computational Design and Mechanics
Pages (from-to)
1-19
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