Objective function and adjoint sensitivities for moving-mask lithography

Van Keulen, Fred van; Hirai, Y; Tabata, O

Objective function and adjoint sensitivities for moving-mask lithography

Conference paper (2008)

Authors

Fred van Van Keulen Computational Design and Mechanics

Y Hirai External organisation

O Tabata External organisation

Research Group

Computational Design and Mechanics

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Published Date

2008

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Research Group

Computational Design and Mechanics

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