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Effects of boron addition on the high temperature oxidation of MoSi2 alloys

Journal Article (2023)
Author(s)

Zhaoying Ding (TU Delft - Team Marcel Hermans)

Hans Brouwer (TU Delft - Team Marcel Hermans)

Jianing Zhu (TU Delft - Team Vera Popovich)

Vera A. Vera (TU Delft - Team Vera Popovich)

M. J.M. Hermans (TU Delft - Team Marcel Hermans)

W. G. Sloof (TU Delft - Team Joris Dik)

Research Group
Team Marcel Hermans
Copyright
© 2023 Z. Ding, J.C. Brouwer, Jia-Ning Zhu, V. Popovich, M.J.M. Hermans, W.G. Sloof
DOI related publication
https://doi.org/10.1016/j.scriptamat.2023.115580
More Info
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Publication Year
2023
Language
English
Copyright
© 2023 Z. Ding, J.C. Brouwer, Jia-Ning Zhu, V. Popovich, M.J.M. Hermans, W.G. Sloof
Research Group
Team Marcel Hermans
Volume number
234
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Abstract

Boron containing MoSi2 is a promising material for applications at high temperature, but the oxidation mechanism is still unclear. In this work, the high temperature (1100 °C) oxidation of B doped MoSi2 in synthetic air has been investigated. A (boro)silicate layer is formed on the surface of the alloy, which features a mixture of amorphous SiO2 and cristobalite. After an initial transient period, the oxidation kinetics follows a parabolic growth rate law. The growth rate constant of the oxide layer is enhanced by the boron in the alloy by 90 % per at.% B. The increase in growth rate is associated with boron mitigating the formation of cristobalite thereby promoting the formation of amorphous SiO2.