Recent developments in coherent Fourier scatterometry
Anubhav Paul (TU Delft - ImPhys/Pereira group)
Sarika Soman (TU Delft - ImPhys/Pereira group)
Silvania F. Pereira (TU Delft - ImPhys/Pereira group)
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Abstract
Coherent Fourier Scatterometry (CFS) enables low-power, high- resolution, non-destructive metrology for nanoscale structures. Recent advancements have extended its applications to improving the measurement of critical dimensions, such as steep-sidewall angles of fabricated nanostructures and the detection and shape determination of defects for semiconductor and power electronics applications. Innovations like beam scanning, multi-beam setups, and synthetic optical holography enhance its speed and sensitivity, making CFS increasingly viable for industrial in-line inspection.
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