Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography

Performance of hydrogen silsesquioxane (HSQ) resist material with respect to the temperature during electron beam exposure was investigated. Electron beam exposure at elevated temperatures up to 90?°C shows sensitivity rise and slight contrast (?) degradation compared to lower temperature cases. Ultrahigh resolution structures formed at elevated...

Photoluminescence enhancement in thin films of PbSe nanocrystals

Remarkable photoluminescence enhancement (PLE) in submonolayer films of PbSe nanocrystals (NCs) upon continuous illumination was observed. The intensity increase from films on InP substrates was highest in vacuum, while for films on Si/SiO2 substrates the PLE was stronger in air. The magnitude of the PLE was found to depend on the excitation...

Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

An extensive investigation has been performed on inductively coupled plasma etching of InP. An important motivation for this work is the fabrication of high-aspect-ratio holes for photonic crystals. The essential chemistry is based on Cl2 with the addition of N2 or O2 for sidewall passivation. The influence of different process parameters such...

Transmission measurement of the photonic band gap of GaN photonic crystal slabs

A high-contrast-ratio (30 dB) photonic band gap in the near-infrared transmission of hole-type GaN two-dimensional photonic crystals (PhCs) is reported. These crystals are deeply etched in a 650 nm thick GaN layer grown on sapphire. A comparison of the measured spectrum with finite difference time domain simulations gives quantitative agreement...

Evaluation of LED application in general lighting

InP-based planar photonic crystals infiltrated with solid polymers and liquid crystals

The filling is reported of the air holes of an InP-based two-dimensional photonic crystal with solid polymer and withliquid crystal 5CB. The polymer filling is obtained by thermal polymerization of an infiltrated liquid monomer,trimethylolpropane triacrylate. The filling procedure for both the monomer and liquid crystal relies on the...

2D InP photonic crystal fabrication process development

We have developed a reliable process to fabricate high quality 2D air-hole and dielectric column InP photonic crystals with a high aspect ratio on a STS production tool using ICP N2+Cl2 plasma. The photonic crystals have a triangular lattice with lattice constant of 400 nm and air-hole and dielectric column radius of 120 nm. Large efforts have...

InP-based two-dimensional photonic crystals filled with polymers

Polymer filling of the air holes of indium-phosphide-based two-dimensional photonic crystals is reported. After infiltration of the holes with a liquid monomer and solidification of the infill in situ by thermal polymerization, complete filling is proven using scanning electron microscopy. Optical transmission measurements of a filled photonic...

Cl2/O2-inductively coupled plasma etching of deep hole-type photonic crystals in InP