Curvature Manipulation of Photomasks - Enhancing the imaging performance of immersion lithography equipment

Doctoral thesis (2013)

Authors

Contributors

R.H. Munnig Schmidt (promotor)
D.J. Rixen (promotor)
Department
Precision and Microsystems Engineering (Mechanical, Maritime and Materials Engineering) (TU Delft)
Copyright: © 2013 Valentin, C.L.
Control Dynamics Mechatronics Immersion lithography Photomask Manipulator Focus Overlay Optical aberrations Piezoelectric actuation
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Published Date

22-05-2013

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ISBN:

9789461861283

Faculty

Mechanical, Maritime and Materials Engineering

Department

Precision and Microsystems Engineering

Abstract

This thesis investigates the feasibility of a photomask curvature manipulator in immersion lithography systems.